Microwave plasma cvd device

Abstract

Abstract PURPOSE:To steadily form a high quality and uniform deposited film with high efficiency and to extend the maintenance cycle of a microwave inlet window by providing a magnetic on the outer periphery of a microwave inlet part to prevent the deposition of a film on the window. CONSTITUTION:A microwave power is appropriately regulated to match with the electric discharge condition in a vacuum vessel, and glow discharge plasma is produced by the microwave. In this case, the magnet 106 is arranged so that a magnetic field 201 is formed in the vicinity of the outer periphery of the microwave inlet window 101 in the same direction as the microwave introducing direction. As a result, the emitted electron 202 draws a motion locus 203, the electron 202 is accelerated toward the weak part of the magnetic field 201, hence the plasma does not approach the window 101, or the plasma density in the vicinity of the window 101 is remarkably lowered. Accordingly, a film hardly deposits on the window 101, and the microwave can be stably supplied into the vacuum vessel at all times.

Inventors

• 👤 Satoru Sugita
• 👤 Shotaro Okabe

Bibliographic Details