Positive type photoresist composition

Abstract

Abstract PURPOSE:To improve the stability of application ability, the sensitivity, the film retention ratio and the resolution of the titled composition by incorporating a 1,2-naphthoquinone diazide sulfonate of 2,3,4-trihydroxy-2'-methyl benzophenone as a guinone diazide type photosensitive component. CONSTITUTION:The titled composition comprises the 1,2-naphthoquinone diazide sulfonate of 2,3,4-trihydroxy-2'-methyl benzophenone as the quinone diazide type photosensitive component. The trihydroxy benzophenone is necessary to have a methyl group at 2'-position thereof, and said 2,3,4-trihydroxy benzophenone having the methyl group at 3' or 4' position is useless. And, the quinone diazide type photosensitive component is preferably used as a solution by dissolving said component together with an alkaline soluble resin in a suitable solvent. Additionally, the titled composition may compound an additive such as a surfactant, a dyestuff, a stabilizer and a sensitizer, etc. Thus, the stability of application ability, the sensitivity, the film retention ratio and the resolution of the titled composition are improved.

Inventors

• 👤 Hiroko Urano
• 👤 Hitoshi Sugiura
• 👤 Hideo Kikuchi
• 👤 Yoji Yamazawa

Bibliographic Details