Preparation of color filter

Abstract

Abstract PURPOSE:To prevent a color filter from occurrence of inferior bonding or color mixing, etc., of the color filter by applying ultrasonic vibration to the etching liquid in the stage for etching selectively a colored polyimide resin layer. CONSTITUTION:In order to develop a photoresist 9 of a silicon substrate 1 which has been exposed, developing soln. is charged to a beaker and the silicon substrate 1 is dipped in the developing soln. and the photoresist is developed at 22 deg.C liquid temp. for 60sec. Then, the beaker is placed in a stainless steel washing tank contg. water, and an ultrasonic wave generator is installed in the tank to generate ultrasonic wave. After dipping the substrate for ca.60sec, excessive color paste layer is etched. The etched silicon substrate 1 is rinsed with water then dried by blowing gaseous N2 to dry the substrate. By this constitution, the etching speed can be made uniform independently of the shape of the surface of the colored polyimide resin layer. Moreover, the etching effect is caused more actively by the vibration of the etching liquid. Thus, selective etching of the colored polyimide resin layer is performed surely.

Inventors

• 👤 Yoshitaka Shibata
• 👤 柴田　良隆
• 👤 Satoru Marutani
• 👤 丸谷　悟
• 👤 Masafumi Nishizumi
• 👤 雅史 西角

Bibliographic Details