Production of information recording medium
Abstract
Abstract PURPOSE:To shorten the time for presputtering and to improve the reproducibility of the deposition process for a recording film by cleaning a target by two stages of the presputterings using a rare gas contg. a specific ratio of O2 and a rare gas. CONSTITUTION:The inside of a vacuum vessel 1 is evacuated and the target 4 consisting preferably of In or Te is first cleaned by the two stages of the 1st presputtering by the rare gas (e.g.: Ar) contg. 2-40% O2 and the 2nd presputtering by 100% rare gas. The recording film is then formed on the substrate on a holder 5 by the plasma sputtering of the gas contg. at least hydrocarbon (e.g.: CH4). The recording film having the uniform recording and reproducing characteristics is efficiently obtd. by the above-mentioned method.
Inventors
- 👤 Yoshikatsu Takeoka
- 👤 竹岡 美勝
- 👤 Norio Ozawa
- 👤 小沢 則雄
- 👤 Noburo Yasuda
- 👤 安田 修朗
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