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JPS6364322A Expired / Lapsed JP ⏱️ 0.0 years remaining

Vapor phase epitaxy equipment

Assignee: Toshiba Corp
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Filing: 1986-09-05
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Granted: —
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Expires: 2006-09-05
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Abstract

Abstract PURPOSE:To reduce the distoution of a reaction tube, and improve the workability of washing, by arranging a pipe body around the reaction tube independently and supplying a gap between the reaction tube and the pipe body with a cooling fluid to cool the reaction tube. CONSTITUTION:Outside a reaction tube 1, a cylinder 10 to cool it with cold air is arranged independently of the reaction tube 1. The cold air which flowed into the cylinder from the cold air introducing inlet A of a reaction tube pressing ring 12 cools the ring 12 and a plate 13, too. Then it collides with the reaction tube 1, and moves upward as shown by arrows. The cold air flows while removing the heat of the reaction tube 1, the ring 12, and the plate 13, so that the temperature rise of the reaction tube 1 and the plate 13 can be prevented. Thereby, the distortion of the reaction tube 1 can be removed, and the workability of washing can be improved.

Inventors

  • 👤 Keiichi Akagawa
  • 👤 赤川 慶一
  • 👤 Isao Matsui
  • 👤 功 松井

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-09 04:47
CPC Classifications
—

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