Gas purifier for semi-conductor manufacturing device

Abstract

Abstract PURPOSE:To grade up purity of gas fed into a reaction chamber by providing, from the flow inlet to the flow outlet side, a first filter, an adsorbent for remov ing impure gas and a high-density second filter for collecting fine particles in a housing. CONSTITUTION:Gas coming from a flow inlet 6 of a housing 2 passes through a plate-shaped first filter 11, and water content and carbon dioxide gas are removed by an adsorbent 9 (for example, zeolite or the like) for removing impure gas, and fine particles such as fine dust, water particles, foreign matters and the like are collected by a following second filter 12. The second filter is constituted of ceramics, metal and the like, and is of high density of around 0.1mu mesh. High-purity gas coming out of the second filter 12 is exhausted out of a flow outlet 7 and transferred to a reaction chamber for semi-conductor manufacturing process.

Inventors

• 👤 Tadahiro Omi
• 👤 忠弘 大見
• 👤 Yoichi Sugano
• 👤 洋一 菅野
• 👤 Osamu Uchisawa
• 👤 内沢　修

Bibliographic Details