Method for forming image having heat-resistance

Abstract

Abstract PURPOSE:To obtain the excellent image with good efficiency by using a photoresist dry film comprising a photosensitive aromatic precursor capable of converting to the aromatic polymer by a heat-treatment which has the heat- resisting property of >=310 deg.C initial temp. of reducing weight by heating, and a photopolymerization initiator as an essential component. CONSTITUTION:The photoresist film comprises the photosensitive aromatic precursor capable of converting to the heat-resisting aromatic polymer by a heat-treatment, which has >=310 deg.C initial temp. of reducing weight by heating or a soluble photosensitive aromatic polymer having >=310 deg.C initial temp. of reducing weight by heating, and the photopolymerization initiator as the essential component. The image having the heat-resisting property is formed by laminating the photoresist film on a substrate, followed by radiating the photoresist layer through a photomask with an active ray and subsequently, giving a high insulating property to the obtd. layer after developing it. Thus, a spin-coating step can be omitted, and a producing step can be made to automatize.

Inventors

• 👤 Kanichi Yokota
• 👤 横田　完一
• 👤 Akihiko Ikeda
• 👤 章彦 池田
• 👤 Hideo Ai
• 👤 愛　英夫

Bibliographic Details