Sputtering film deposition equipment

Abstract

Abstract PURPOSE:To accurately control the compsn. of thin compd. films or thin mixture films and to enable the formation of thin films having a layered structure by controlling the periodic current waveform for driving electromagnets provided with built-in magnetron cathodes and the state of magnetron discharge on a target. CONSTITUTION:Permanent magnets 4a, 4b provided with built-in magnetron cathodes and connected to targets 2a, 2b are partially or entirely replaced with electromagnets 3a, 3b and a periodically changing prescribed wave-form of electric current is impressed with power sources 5a, 5b for driving the electromagnets 3a, 3b. A prescribed wave-form of electric current for discharge synchronous with the on-off state of the magnetrons is further impressed with power source 6a, 6b and sputtering is carried out. Thus, thin films having a layered structure, thin compd. films or thin mixture films can be accurately controlled and the damage of thin films by gamma-electrons due to an unstable state of the magnetrons can be suppressed.

Inventors

• 👤 Shinji Fujii
• 👤 眞治 藤井

Bibliographic Details