Water soluble stripping liquid for positive type photoresist

Abstract

Abstract PURPOSE:To permit stripping even a high-temp. post-baked photoresist without using chlorine solvents and general org. solvents in rinsing by incorporating 1,3-dimethyl-2-imidazolidinone and water soluble org. amine into the titled liquid. CONSTITUTION:The compounded liquid into which the 1,3-dimethyl-2- imidazolidinone and water soluble org. amine are incorporated is used. More specifically, the stripping liquid mixed with the 1,3-dimethyl-2-imidazolidinone and org. amine at 15:85-70:35wt.% mixing ratio is preferably used. The stripping of even the high-temp. post-baked resist is thereby permitted without using the chlorine solvents and general org. solvents in rinsing of a wafer after stripping of the photoresist.

Inventors

• 👤 Akira Otani
• 👤 亮 大谷
• 👤 Kiyoto Mori
• 👤 森　清人

Bibliographic Details