Stage for substrate exposure apparatus

Abstract

Abstract PURPOSE:To obtain a stage with decreased movable range, by providing a registering index on a face on which a substrate is disposed, while providing, in said face, means for retreating the index to a position not interfering with the substrate. CONSTITUTION:Before disposing a substrate on the top face 2 of a stage 1, air is fed through a bore 12b of a guide 12 while air is sucked through a bore 11b of a guide 11 so that a flange 13a is applied against the upper end of a cylinder 11c of the guide 11. An index 14 is thereby elevated to the level that the surface of the substrate takes when it is carried on the stage, and is fixed there. The substrate is positionally adjusted to a reticle by means of the index 14. After the adjustment is completed, the stage 1 is moved such that the top face 2 returns to the initial position at which the surface is disposed thereon, and air is sucked through the bore 12b while air is fed through the bore 11b so that the index 14 is retreated to a position not interfering with the substrate. When completion of retreaval is detected, the substrate is disposed on the top face 2 of the stage 1. Accordingly, the movable range of the stage can be decreased and the stage can be constructed in a smaller size.

Inventors

• 👤 Yutaka Endo
• 👤 豊 遠藤

Bibliographic Details