Microwave plasma generation device

Abstract

Abstract PURPOSE:To reduce reflection of microwave and also to generate uniformly plasma in the whole range by providing transferably a reflection plate to a dielectric material coating line and slanting at least one hand of the dielectric material coating line and a reactor. CONSTITUTION:A waveguide 2 and a dielectric material coating line 3 are constituted in a separated body. A reflection plate 5 is provided to a terminal of the line 3 attachably, detachably and transferably in the direction of the waveguide 2. A reactor 6 is provided to the under part of the line 3. A quartz glass plate 7 or the like is mounted on the top surface of the reactor 6 and microwave is introduced into the inside of the reactor 6 through it. The reactor 6 is slanted by providing a tilt angle regulation member 8 to the under part of the reactor 6 and the interval of a side opposite to a microwave oscillator 1 between the reactor 6 and the line 3 is made narrow. The line 3 may be slanted instead of slanting the reactor 6 or both may be slanted. After the generation of plasma, the reflection of microwave is minimized by transferring the reflection plate 5.

Inventors

• 👤 Kyoichi Komachi
• 👤 小町　恭一
• 👤 Sumio Kobayashi
• 👤 純夫 小林

Bibliographic Details