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JPS6286782A Expired / Lapsed JP ⏱️ 0.0 years remaining

Quantum well laser

Assignee: NEC Corp
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Filing: 1985-10-11
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Granted: —
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Expires: 2005-10-11
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Abstract

Abstract PURPOSE:To improve carrier implantation efficiency of electrons into a quantum well and obtain a quantum well laser with small threshold current and excellent temperature characteristics by a method wherein the energy difference between the 1st level of the bound levels of electrons of a potential well separated from the quantum well by a barrier layer and the (n)th level of the bound levels of electrons of the quantum well is selected to be smaller than the specific value. CONSTITUTION:A quantum well 5 which is to be an active layer, at least one barrier layer 4 contacted with the quantum well 5 and at least one potential well 3 separated from the quantum well 5 by the barrier layer 4 are provided. The energy difference between the bound level of electrons of the potential well 3 and the (n)th level (wherein n>=2) of the bound levels of electrons of the quantum well 5 is selected to be smaller than 50meV. With this constitution, electrons which are implanted into the potential well 3 are quickly implanted into the quantum well 5 and can contribute to light emission and electrons can be implanted into the quantum well highly efficiently so that a quantum well laser with small threshold current and excellent temperature characteristics can be obtained.

Inventors

  • 👤 Mitsunori Sugimoto
  • 👤 杉本 満則

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-08 17:26
CPC Classifications
B; B82; B82Y; B82Y20/00; H; H01; H01S; H01S5/00; H01S5/30; H01S5/34; H01S5/3415; H01S5/3418

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