Correcting method defect for of photomask

Abstract

Abstract PURPOSE:To decrease the occurrence of separation of a correcting part by irradiating a laser beam or electronic beam to a defective part to be corrected on a photomask in the mixed gas atmosphere with metallic compound gas and carbon compound gas, forming silicon carbide at the defective part and filling the defective part. CONSTITUTION:In a vacuum container 12, a photomask 10 having a defect to be corrected is arranged, and a vacuum degree specified beforehand is kept in the vacuum container 12. Next, by using the stage system, the laser beam irradiating position of a laser beam generating source 4 is almost opposite to a pin hole 3 to be corrected for the photomask, and the silane gas and the carbon dioxide gas are introduced into the vacuum container 12. The position, where a laser beam 5 is irradiated, corresponds to the pin hole 3, a fine area 6 is irradiated so that the irradiating scope can be the same size as the pin hole 3, the beam diameter of the laser beam 5 is adjusted and the pin hole 3 is irradiated. A silicon carbide SiC is formed and accumulated to the pin hole 3, the pin hole 3 is filled by a silicon carbide 13 and comes to be transparent. Thus, without worry about the peeling off of the defect correcting part, correction can be executed without fail.

Inventors

• 👤 Shuichi Matsuda
• 👤 修一 松田
• 👤 Yaichiro Watakabe
• 👤 渡壁　弥一郎

Bibliographic Details