Similar converting system for pattern

Abstract

Abstract PURPOSE:To obtain an enlarged and reduced pattern from one original pattern with a high quality by giving line width control information to a flection point significant to the line width control, referring to the line width control information at the time of the expanding or reducing of the pattern, executing the control of the line width and enlarging and reducing the pattern. CONSTITUTION:The flection point on the pattern outline is extracted by an extracting means 1. To the flection point significant to the line width control to constitute the longitudinal line of the pattern and the horizontal line, or the longitudinal line and the horizontal line and the decoration connected to these in the extracted flection point, the line width control information is added by an adding means 2. After such a pretreatment is executed, when the pattern is enlarged or reduced, the line width control information is referred to by a line width control means 3, the information is used for the control of the line width and the enlargement and the reduction of the pattern is executed. Thus, the pattern enlarged or reduced from one original pattern can be obtained with a high quality.

Inventors

• 👤 Katsuhiko Nishikawa
• 👤 克彦 西川
• 👤 Shigemi Osada
• 👤 茂美 長田
• 👤 Akira Inoue
• 👤 彰 井上

Bibliographic Details