Electron beam vapor deposition device

Abstract

Abstract PURPOSE:To form a desired vapor deposited film on a substrate with good accuracy by regulating the temp. of cooling water in the stage of subjecting a vapor deposition source hearth contg. a vapor deposition material to water cooling. CONSTITUTION:The vapor deposition material 5 is housed in the evaporation source hearth 4 in a vapor deposition chamber 1 and is evaporated by the electron beam from an electron gun 3 provided to a ceiling surface to form the vapor deposited film on the substrate 7. The hearth 4 is cooled with the cooling water 10 circulated from a water tank 9 so as not to be evaporated by the electron beam. A water temp. regulator 11 is provided to the water tank 9 to regulate the temp. of the cooling water 10. The quality of the vapor deposited film is thereby controlled without depending on the heating temp. of the substrate 7 and the quality of the film is controlled with good accuracy.

Inventors

• 👤 Hirokazu Kaneda
• 👤 金田　裕和

Bibliographic Details