Gas phase growth apparatus

Abstract

Abstract PURPOSE:To bring uniformly the reaction gas into contact with a wafer on a susceptor by providing plural gas feeding nozzles to the end part side of the susceptor wherein the distance from axial core is shorter than the other hand the changing the distance of each nozzle hole from the axial core of the susceptor. CONSTITUTION:A barrel type susceptor body 11 having the gradient in the axial direction is fitted to a rotary axis which is lengthened upward by perforating a base plate. Plural pieces of nozzles 18A through which the reaction gas is fed in the axial direction nearly along the surface of the susceptor 11 are fitted to the end part side of the 11 wherein the distance from the axial core is shorter than the other hand. The distance of the nozzle holes 36 of the nozzles 18A from the axial core of the susceptor is changed so as to be shown by R1 and R2. Thereby the reaction gas is uniformly brought into contact with all the wafers 12 arranged on the gradient surface of the susceptor assembly body 11. By this mechanism, the film thickness of gas phase growth becomes the specified value and also the productivity can be increased.

Inventors

• 👤 Masayuki Nozawa
• 👤 野沢　昌幸

Bibliographic Details