Contamination preventing mechanism of light source in photo-reaction apparatus

Abstract

Abstract PURPOSE:To prevent the contamination of a light source by reactive gas and the damage thereof by contamination, by imparting predetermined conductance to the flow of gas in order to generate the predetermined difference in a vacuum degree between the light incident and emitting ends of a vacuum propagation part. CONSTITUTION:In a photo-reaction apparatus consisting of a light source 1 for emitting exciting light inducing predetermined photo-reaction, a reaction container 2 filled with reactive gas excited by said exciting light and a light propagation part 10 reaching the light incident part of the container 2 from the light source 1, the whole of the light propagation part 10 or a part of said light propagation part 10 contacted with said light incident part is evacuated to a predetermined vacuum degree. In order to generate the predetermined difference in a vacuum degree between the light incident and emitting ends of the evacuated vacuum light propagation part 10, a conductance reducing part 30 provided with a piercing hole by drilling along the beam shape of exciting light and predetermined conductance is imparted to the flow of gas. By this method, the contamination of the light source by reactive gas and the damage thereof by contamination can be prevented.

Inventors

• 👤 Oku Kuraki
• 👤 億 久良木
• 👤 Tsuneo Urisu
• 👤 恒雄 宇理須

Bibliographic Details