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JPS6136928A Expired / Lapsed JP ⏱️ 0.0 years remaining

Evacuator

Assignee: Toshiba Corp
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Filing: 1984-07-30
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Granted: —
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Expires: 2004-07-30
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Abstract

Abstract PURPOSE:To remove the charging of the surface of a substrate to be treated, and to prevent the adhesion of dust by providing a means through which an ionized gas is introduced to the substrate to be treated when a vacuum chamber is returned to a low vacuum state containing normal pressure from a vacuum state. CONSTITUTION:A pre-chamber 2 is adjoined to a working chamber 1 under a vacuum state, and a gate valve 3 is fitted to a partition wall between both chambers. A stage 4 movable in the X and Y directions is positioned in the chamber 1, and an electrooptic lens tube 6 with an electron gun 7 and an irradiating window 5 are mounted to the upper wall of the chamber 1. A controller 8 controls the electron gun 7 and stage 4. The lower wall of the chamber 2 is connected to a vacuum pump 10 while interposing a vacuum valve 11. A holder is placed into the chamber 2, and a base 12 moved by a loader 13 is installed. A piping 14 connected to a nitrogen bomb 15 is mounted onto the upper wall of the chamber 2, and an ion generator 17 with a high-tension generator 20 is fitted to the piping.

Inventors

  • 👤 Fumiaki Shigemitsu
  • 👤 重光 文明
  • 👤 Bunro Komatsu
  • 👤 小松 文朗
  • 👤 Shigeharu Horiuchi
  • 👤 堀内 重治

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-24 10:49
CPC Classifications
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