Cleaning of semiconductor substrate

Abstract

Abstract PURPOSE:To make cleaning operation efficient while preventing any external impurities from entering into a cleaning vessel by a method wherein a semiconductor substrate is cleaned up with isopropylalcohol while any waste solution containing water, acid content, ionic substance and particles etc. is regenerated by a distillation still to be circulated for reuse within a closed system. CONSTITUTION:Semiconductor substrate to be cleaned in a cleaning vessel 1 is cleaned up with isopropylalcohol and then any waste solution containing water, acid content, ionic substance and particles etc., after cleaning is accumulated in a waste solution tank 3. Next the waste solution is fed to a pervaporization chamber 4 composed of a separating film 5 and a transmitting steam chamber 6 by a pump for dehydration as well as to distillation still 8, making use of back pressure through the intermediary of a line 7 to remove any impurity by the still 8 comprising a filler 9 and a condenser 10 for accumulating refined alcohol in an intermediate tank 11. Later the refined alcohol supplied with any supplementary new alcohol as necessary is fed back to the cleaning vessel 1 through the intermediary of another line 12.

Inventors

• 👤 Shigeo Komatsubara
• 👤 小松原　繁男
• 👤 Toru Nonaka
• 👤 徹 野仲
• 👤 Koichi Toi
• 👤 戸井　興一
• 👤 Yasuhiro Kagiyama
• 👤 鍵山　安弘

Bibliographic Details