Low reflection working agent

Abstract

Abstract PURPOSE:To improve the durability by forming the low reflection working agent of a bis-silane compound containing a polyfluoroalkylene group shown by a formula or condensate, or a cocondensate of the compound shown by the formula and another silane compound. CONSTITUTION:The low reflection working agent is formed of the bis-silane compound containing the polyfluoroalkylene group shown by the formula [X is Cl, OR<1>, R<1>COO (R<1>: lower alkyl group) and Rf is a polyfluoroalkylene group having at least one CnF2n+1 (m: integer between 1-6) branch and may contain -(CH2)m- (m: integer between 1-3), -O-, -S-, etc.] or condensate, or condensate shown by the formula and another silane cocondensate. This working agent when used is diluted with an organic solvent of acetone, alcohol, etc.

Inventors

• 👤 Hitoshi Matsuo
• 👤 仁 松尾
• 👤 Nobuyuki Yamagishi
• 👤 展幸 山岸
• 👤 Keiichi Onishi
• 👤 大西　啓一

Bibliographic Details