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JPS6090812A Expired / Lapsed JP ⏱️ 0.0 years remaining

Manufacture of high purity silica

Assignee: Nippon Chemical Industrial Co Ltd
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Filing: 1983-10-22
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Granted: —
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Expires: 2003-10-22
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Abstract

Abstract PURPOSE:To manufacture high purity silica having a low impurity content by treating a purified aqueous soln. of a crystalline alkali silicate with ion exchange resins to prepare silica sol, converting the silica sol into silica gel, and heat treating silica gel. CONSTITUTION:A recrystallized product of a crystalline alkali silicate such as sodium metasilicate having 0.5-1.5 molar ratio of SiO2/Na2O is dissolved in water. This aqueous soln. is purified by ultrafiltration or coprecipitation with a finely-divided insoluble substance, and the purified aqueous soln. is successively treated with a cation exchange resin, an anion exchange resin and a cation exchange resin to prepare acidic silica sol. Silica gel is deposited in the purified silica sol by adding a coagulant, and it is heated at about 500 deg.C to manufacture high purity silica contg. <=1ppb U and <=10ppb Th.

Inventors

  • 👤 Toshihiko Morishita
  • 👤 森下 敏彦
  • 👤 Hitoshi Koshimizu
  • 👤 仁 輿水
  • 👤 Kazuyoshi Torii
  • 👤 鳥井 一義

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-09 08:45
CPC Classifications
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