Spin drier

Abstract

Abstract PURPOSE:To effect supercleaning on a wafer by providing gas injection substrates on upper and lower sides of the wafer interposed therebeteen or on one side thereof and by drying the wafer while floating and rotating the same. CONSTITUTION:Two gas injection substrates 10 and 11 are disposed on upper and lower sides of a semiconductor wafer 1, respectively. A multiplicity of injection orifices 10P and 11P provided on both the substrates inject a gas to dry the wafer. The gas is injected through respective gas reservoir chambers 10B and 11B in the gas injection substrate 10 and 11, at the angle theta with respect to the wafer 1. The gas reservoir chambers 10B, 11B have a torus shape. A good precision control of the amount of gas injected from the substrates allows the semiconductor wafer to be held floating in the space and to rotate at a high rate, whereby the wafer can be dried with the injection gas.

Inventors

• 👤 Yuji Okuma
• 👤 大熊　裕二

Bibliographic Details