Electron-beam exposure device

Abstract

Abstract PURPOSE:To increase the speed of drawing of patterns containing oblique lines without reducing the speed of drawing of patterns containing no oblique line by selectively forming rectangular or right-angled triangular electron beams by improving an aperture mask. CONSTITUTION:A rectangular aperture 12a is formed to a first aperture mask 12, and an aperture 13a having seven sides of three sides (a)(b)(c), either side thereof runs parallel with the aperture 12a, and four sides (d)(e)(f)(g) having angles of 45 deg. to either of these sides (a)(b)(c) is formed to a second aperture mask 13. Consequently, rectangular beams can be shaped from the aperture 12a and the sides (a)(b) or sides (b)(c) of the aperture 13a and right-angled triangular beams from the aperture 12a and either one of the sides (d)(e)(f)(g) of the aperture 13a. Accordingly, when a pattern containing a rectangle and an oblique line is drawn, it may be drawn only by six-time exposure of the drawing of divided patterns 1, 2 by the rectangular beams and the drawing of divided patterns 3-6 by right-angled triangular beams.

Inventors

• 👤 Kanji Wada
• 👤 和田　寛次
• 👤 Tadahiro Takigawa
• 👤 忠宏 滝川

Bibliographic Details