Chemical reaction device for vapor-phase epitaxial growth

Abstract

Abstract PURPOSE:To keep airtightness, to prevent admixture of impurities, and to improve safety, by equipping detachably a flange set at the end of a gas feed opening of a reaction chamber with gas inlets and a gas blender in a sealing way. CONSTITUTION:The fixing flange 6 is attached to the peripheral part 5 of a gas feed opening at the top of the reactor 1 having the arranged holder 3 supporting the substrate 2 in an integrated way, and the funnel-shaped gas blender 7 extending along the centerline of the reactor 1 and the gas feeder 8 with the plural gas inlets 9 and 10 are set on the flange 6. The ring-shaped indium sealing channels 11 and 12 forming an extremely high-vacuum sealing mechanism are set at the top faces of the flange 6 and a flange of the gas blender 7, and the ring- shaped guide plate 13, and the devices 7 and 8 are detachably attached to the flange 6 by the clamping bolt and nut members 14 in a sealing way.

Inventors

• 👤 Toshio Hayashi
• 👤 俊雄 林
• 👤 Yoshiyasu Maebane
• 👤 前羽　良保

Bibliographic Details