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JPS60164702A Expired / Lapsed JP ⏱️ 0.0 years remaining

Production of hologram diffraction grating

Assignee: Ricoh Co Ltd
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Filing: 1984-02-06
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Granted: —
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Expires: 2004-02-06
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Abstract

Abstract PURPOSE:To improve the strength of a diffraction grating pattern consisting of photoresist and to prevent effectively cracking of the diffraction grating pattern under environmental conditions by coating a silane coupling agent as a precoating layer. CONSTITUTION:A silane coupling agent has a group bondable with an org. resin and a group bondable with an inorg. group and is gamma-glycydoxypropyl trimethoxysilane, etc. The treatment is executed by dissolving said agent in a solvent and coating and drying the soln. Photoresist is then coated thereon and is subjected to holorgram recording. For example, a diffraction grating 35 is formed via silane coupling agent coating layer 33 on a glass substrate 31. An inter-grating spacing D can be controlled by the angle between the two luminous fluxes interfered on the photoresist and the wavelengths of the luminous fluxes. A grating depth (h) can be controlled by controlling prebaking conditions, exposing time, developing time and concn. of a developing soln. The grating is then subjected to necessary post treatments such as rinsing, drying and post baking.

Inventors

  • 👤 Koji Ujiie
  • 👤 氏家 孝二
  • 👤 Toru Oda
  • 👤 徹 織田

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-10 02:28
CPC Classifications
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