Patent JPS60145903A successfully refreshed from Google Patents.
JPS60145903A
Expired / Lapsed
JP
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Synthesis of inorganic polysilazane
Assignee: Tonen General Sekiyu KK
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Filing: 1983-12-29
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Granted: —
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Expires: 2003-12-29
Abstract
Abstract PURPOSE:To synthesize an inorganic polysilazane suitable for the production of sintered silicon nitride, easily, in high yield, by forming an adduct of a halosilane, and reacting the adduct with ammonia. CONSTITUTION:A halosilane (e.g. dichlorosilane) is added to a base (e.g. pyridine, picoline, etc.) in nitrogen gas atmosphere to form an adduct having a molar ratio (base/halosilane) of 2/1. A mixture of ammonia and nitrogen gas is blasted into and reacted with the adduct to obtain an inorganic polysilazane having a polymerization degree of about 15-40. The reaction temperature is preferably -78-+100 deg.C, especially -40-+80 deg.C.
Inventors
- 👤 Takeshi Isoda
- 👤 磯田 武志
- 👤 Mikiro Arai
- 👤 新井 幹郎
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-08 14:48
CPC Classifications
C; C08; C08G; C08G77/00; C08G77/60; C08G77/62; C01; C01B; C01B21/00; C01B21/06; C01B21/068; C01B21/082; C01B21/087; C04; C04B; C04B35/00; C04B35/515; C04B35/58; C04B35/584; C04B35/589; C04B35/622; C04B35/62227; C07; C07F; C07F7/00; C07F7/02; C07F7/025; C01P; C01P2002/00; C01P2002/80; C01P2002/82; C01P2002/86; C01P2004/00; C01P2004/10
Claims Analysis
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References Cited (Backward Citations)
US4397828A
Cited
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