Production of thin film magnetic head

Abstract

Abstract PURPOSE:To work the size of the track width of upper and lower magnetic substances uniformly and to obtain a magnetic head characterized by high quality and high performance by forming a mask pattern consisting of a prescribed material on the upper magnetic substance and ion-milling a pasrt for regulating the track width of the upper and lower magnetic substances. CONSTITUTION:A ground film 2, the lower magnetic substance 3, a gap material 4, a conductive coil 5, an inter-layer insulating substance 6 are laminated on a substrate 1 and an upper magnetic substance film 7A is formed on the whole surfasce of the substrate. A metal oxide film 9A such as alumina which is chemically stable and a high ion-milling speed is formed on the upper magnetic substance layer film 7A and etched to obtained a mask 9. Then, the upper magnetic substance film 7A is etched by ion-milling using Ar gas. Parts other than a front gap past are covered with photoresist, the whole surface is ion-milling and the gap material 4 and the lower magnetic substance 3 are trimmed by the mask 9. Then, the photoresist is removed. Consequently, the track width size of the upper and lower magnetic substances is uniformly worked.

Inventors

• 👤 Tetsuo Kobayashi
• 👤 哲夫 小林
• 👤 Yukihisa Tsukada
• 👤 塚田　幸久
• 👤 Shinji Narushige
• 👤 成重　真治
• 👤 Shinichi Hara
• 👤 原　眞一

Bibliographic Details