Magnetron sputtering apparatus

Abstract

Abstract PURPOSE:To provide a magnetron sputtering apparatus enlarged in the available utilizing region of a target, by making the mutual positional relation of a pair of magnets arranged in the vicinity of the surface of a cathode target opposed to an anode variable. CONSTITUTION:A pair or more of magnets 6a, 6b of which mutually different magnetic pole surfaces are directed to an anode are arranged in the vicinity of the surface of a cathode target 2 opposed to the anode arranged in a vacuum container. These magnets 6a, 6b for generating magnetic fields are formed into a mutually movable structure or at leastone of each pair of the magnets 6a, 6b is made exchangeable with a magnet different in a size. By this method, sputtered regions 9, 9' are enlarged and the usable time of the same target 2 can be prolonged. In addition, the structural irregularity of a product can be suppressed.

Inventors

• 👤 Yuji Haji
• 👤 土師　裕二

Bibliographic Details