Method for synthesizing carbon film and carbon granule in vapor phase

Abstract

Abstract PURPOSE:To obtain a diamond film contg. no impurities and having an easily regulated thickness or a carbon film useful as a semiconductor and carbon granules by reacting gases capable of feeding halogen atoms, hydrogen atoms and carbon atoms in a vapor phase. CONSTITUTION:Gases capable of feeding halogen atoms, hydrogen atoms and carbon atoms or a mixture of the gases is used as starting material to synthesize a carbon film and carbon granules by a vapor phase reaction. Fluorine is preferably used as the gas capable of feeding halogen atoms. The gas capable of feeding hydrogen atoms includes methane, and the gas capable of feeding carbon atoms includes halogenated carbon. The gases are mixed and diluted with an inert gas such as He or Ne as required. The vapor phase synthesis is carried out by converting the gases in a reaction chamber into plasma by discharge or other method. For example, the gaseous mixture is ionized by glow discharge.

Inventors

• 👤 Mitsuo Matsumura
• 👤 松村　光雄
• 👤 Toshihiko Yoshida
• 👤 利彦 吉田

Bibliographic Details