Item with antistatic thin film having friction-reducing potential

Abstract

Abstract PURPOSE:To obtain titled item with the film firmly bonded and highly durable, also retaining titled characteristics over a long period, by providing the surface of a base with a thin film consisting of a silicon-contg. plasma-polymerized material having triple bond. CONSTITUTION:A discharge plasma of a carrier gas (e.g, Ar, He) and a gaseous monomer (e.g. a gaseous organosilicon having triple bond such as ethynyl trimethylsilane) are mixed, followed by applying an electric field while keeping the gas at reduced pressure exposing the gas to the surface of a base to be treated (e.g, a plastic film) to form on the surface a plasma-polymerized film of 0.001- 10mu thick, thus obtaining the objective item. EFFECT:Capable of high-speed continuous formation of the film.

Inventors

• 👤 Masatoshi Nakayama
• 👤 正俊 中山
• 👤 Haruyuki Morita
• 👤 治幸 森田
• 👤 Yuichi Kubota
• 👤 悠一 久保田

Bibliographic Details