Method for electron beam exposure

Abstract

Abstract PURPOSE:To reduce the overhead of the titled electron beam exposure by a method wherein, when performing the electron beam exposing method of vector scanning system, said exposing method is conducted by making a deflection correction even when the stage is in moving state when the position whereon an electron beam is to be irradiated is within the scannable range. CONSTITUTION:When the exposing process for a pattern is finished and the movement of a stage 3 is started (F), this movement is performed by having a stage control circuit 6 function to operate a motor 4 in accordance with the command given by CPU 7. A laser counter 5 detects the position of the stage 3 at all times, and transmits the same to a deflection correcting unit 9. The next pattern data is outputted from a pulse generator PG8 by the command outputted from CPU 7 simultaneously with the start of movement, the unit 9 makes correction of the signal indicating the position of the stage 3 on the above pattern data and transmits to a D/A converter 10. An analogue signal is outputted to a deflector 12 as the deflection current wherein a deflection correction has been made through the intermediary of an amplifier. At the same time, an electron beam 2 is radiated in accordance with the command of the CPU and deflected to the prescribed position by the deflector 12. Accordingly, the exposure is started from the point F.

Inventors

• 👤 Toshihiko Osada
• 👤 俊彦 長田

Bibliographic Details