Surface potential controlling method
Abstract
Abstract PURPOSE:To control the surface potential of a photoconductive layer corresponding to its film thickness by measuring the film thickness of the photoconductive layer whose current and surface potential are in unchangeable relation, and controlling to flow the current corresponding to the film thickness. CONSTITUTION:On a photosensitive drum 1, a photoconductive layer of As2Se3, Se-Te, etc., is provided. Then, a current flowing in the photoconductive layer and its surface potential are in nearly unchangeable relation. A signal from a probe 10 for measuring the thickness of the photoconductive layer is converted by a film thickness measuring circuit 11 into a signal for showing the film thickness, which is inputted through an amplifier 12 to an operator 13 to control the total output current, etc., of a variable high voltage power source 3. Then, a signal for obtaining the inflow current corresponding to the film thickness is outputted to control the charged surface potential by a corona charger 2.
Inventors
- 👤 Koji Matsushita
- 👤 松下 浩治
- 👤 Kunishiro Seino
- 👤 國城 情野
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