Electrostatic chuck device

Abstract

Abstract PURPOSE:To previously prevent an induction material from rotation or movement in the gravity direction by a method wherein a pair of electrodes in an electrostatic chuck device are arranged so that electric line of force traversing said induction material may always be constant against the rotation or movement in the gravity direction of the induction material. CONSTITUTION:With a high voltage in about kV applied across electrodes 22a, 22b, electric line of force is emitted from the electrode 22a in a straight line and enters into a sample 24. In the event of a material with low electric resistance like a wafer S1, no electric field is generated in the sample 24, but electric line of force is emitted from the side facing to the electrode 22b and enters into the electrode 22b in a straight line. Force in (z) direction, namely the magnitude of suction force by static electricity is proportional to the square of the applied voltage and is inversely proportional to the square of the distance as far as the sample 24. In other words, the larger applied voltage V causes the stronger attraction force and stronger adhesiveness between the sample 24 and the electrodes 22a, 22b permits chucking by strong power.

Inventors

• 👤 Haruo Okano
• 👤 晴雄 岡野
• 👤 Takashi Yamazaki
• 👤 隆 山崎
• 👤 Yasuhiro Horiike
• 👤 靖浩 堀池

Bibliographic Details