Target material for high-speed sputtering

Abstract

Abstract PURPOSE:To elongate the life of a target material used in a high-speed magnetron sputtering apparatus by providing magnetic anisotropy to the material in a perpendicular direction to the surface. CONSTITUTION:By providing anisotropy to a target material 7'' in a perpendicular direction to the surface, when high-speed sputtering is carried out, a magnetic field is formed in the arrow directions by magnets 5 without piercing through the material 7'' in the lateral direction, and the dissipation of the material 7'' can be inhibited. Accordingly, even if the material 7'' is as thick as about 5-10mm., the life can be elongated.

Inventors

• 👤 Kazuo Kobayashi
• 👤 和雄 小林

Bibliographic Details