Apparatus for exposing charged particle beam

Abstract

Abstract PURPOSE:To improve accuracy of the pictured positions so much without increasing a time necessary for picturing by an apparatus wherein a cassette is made homoiothermal at a given temperature beforehand, a processing chamber, a preparatory chamber and the lower surface of an object lens are respectively made homoiothermal, and stage temperature, cassette temperature within the preparatory chamber, cassette temperature within a thermostatic chamber as well as the lower surface temperature of the object lens are controlled at a roughly equal level. CONSTITUTION:Each cassette 7 within a preparatory chamber 2 is made homoiothermal beforehand using a thermostatic chamber 21 of a given temperature. Thermal radiation from the lower surface of an object lens 19 is restricted with a constant-temperature water piping 22 and a constant-temperature water system 23. After storage in the thermostatic chamber 21, a magazine 8 is placed with in the preparatory chamber 2 which is then vacuumed from the atmospheric pressure. At this time, cassette temperature is lowered ca. 0.1 deg.C due to adiabatic expansion. Then, the cassette 7 is transferred onto an X-Y stage 4 within a processing chamber 1 and a mark pattern is pictured on a mask substrate 6. Temperatures of the X-Y stage 4, the mask substrate 6, etc. are measured only one time when adjusting thereby to attain temperature conditions for the constant-temperature water and the thermostatic chamber 21 at which those temperatures become given ones. High pictured position accuracy of + or -0.1mum can be obtained just through temperature control based on such temperature conditions.

Inventors

• 👤 Tadahiro Takigawa
• 👤 忠宏 滝川
• 👤 Kanji Wada
• 👤 和田　寛次
• 👤 Sadao Sasaki
• 👤 佐々木　貞夫
• 👤 Kazuyoshi Sugihara
• 👤 和佳 杉原

Bibliographic Details