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JPS5794573A Expired / Lapsed JP ⏱️ 0.0 years remaining

Etching device

Assignee: Toshiba Corp
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Filing: 1980-12-02
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Granted: —
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Expires: 2000-12-02
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Abstract

Abstract PURPOSE: To perform uniform etching without causing the generation of defects of a body to be etched by filling and discharging an etching soln. into and from the position of said body below spray nozzles, and performing immersion-spray etching continuously. CONSTITUTION: A shutter 17 is moved into a vessel 1, and is put in tight contact with the side face of the extended leading end part of a segmenting body 6, thence a communicating port 7 is closed, and a body 24 to be etched is held to a rotatable chucking disc 14 of a holding mechanism 10 on the top surface of the body 6. Next, an etching soln. 2 in the bottom part of a vessel is supplied through a pipe 20 and a filter 22 to the upper part of a vessel 1 by a circulating mechanism 9 and is filled to above the disc 14, then the body 24 is immersed therein and is etched uniformly. Thence, when a shutter 17 is retreated, the soln. is discharged to the lower part of the vessel and lowers from the disc 14. At the same time, the disc 14 is rotated and the soln. 2 is sprayed from a spray nozzle 3 on the upper wall surface of the vessel onto the surface of the body 24, whereby spray etching is accomplished and the foreign matter and the like stuck to the surface are removed. COPYRIGHT: (C)1982,JPO&Japio

Inventors

  • 👤 Kinya Usuda
  • 👤 Nobuji Tsuchiya

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-03 15:28
CPC Classifications
—

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