Formation of fluoroalkyl acrylate polymer film on substrate

Abstract

Abstract PURPOSE:To improve the dry etching resistance of a film by polymerizing fluoroalkyl acrylate in an inert gas excited by glow discharge. CONSTITUTION:Fluoroalkyl acrylate represented by formula RfR<2>OCOCR<1>=CH2 (where Rf is 1-15 C perfluoroalkyl or a group having at least 1 fluorine atom, R<1> is H, methyl, ethyl or halogen, and R<2> is a bivalent hydrocarbon residue) is put in a container 8 and fed to a vacuum vessel 1 evacuated with a vacuum pump 11 through a trap 10. Ar is fed from an inert gas container 2 and excited by passing through a glow discharge zone formed with a dielectric coil 4. The acrylate joins the excited Ar and contacts with a substrate (not shown) on a sample holder 9 to form a polymer film. This film is superior as a resist to a film obtd. by coating a polymer.

Inventors

• 👤 Shuzo Hattori
• 👤 Shinzo Morita
• 👤 Tsuneo Fujii

Bibliographic Details