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JPS5780356A Expired / Lapsed JP ⏱️ 0.0 years remaining

Photosensitive compound

Assignee: National Institute of Advanced Industrial Science and Technology
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Filing: 1980-11-07
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Granted: —
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Expires: 2000-11-07
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Abstract

Abstract NEW MATERIAL:A photosensitive compound of formula I. USE: A component of phtotosensitive resins: the spectral sensitivity is especically high in the range of 300W400nm. The combination thereof with a sensitizer enables the sensitization in more long-wave zones, i.e., over a wide range in the visible zone. PREPARATION: The condensation reaction of a compound of formula II with a double amount of a compound of formula III or its derivative gives the compound of formula I. The compound of formula I is contained in a solution of a high-polymer compound such as natural rubber soluble in a solvent, modified rubber such as cyclic rubber, synthetic rubber such as styrene-butadiene rubber by a small amount, e.g., 0.1W10wt% and used as a photosensitive resin. The solution is coated on a base plate, irradiated with light according to the objective image and developed with a solvent. The parts exposed to light are insolublized to form the image. The raw materials are readily available, inexpensive and the compound of formula I is easily produced in high yield. COPYRIGHT: (C)1982,JPO&Japio

Inventors

  • 👤 Akira Yabe

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-08 17:20
CPC Classifications
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