Vapor phase reacting apparatus

Abstract

Abstract PURPOSE: To uniformly treat many wafers by vertically setting a plurality of susceptors each supporting wafers on a horizontally rotating plate placed in a bell jar and installing a high frequency coil along the outside of the rotation locus of the susceptors. CONSTITUTION: The titled apparatus is composed of a bell jar 11 forming space as a reactor, a horizontally rotating plate 12 in the jar 11, susceptors 15 attached on the plate 12 and a high frequency coil 17 installed along the outside of the rotation locus of the susceptors 15. The susceptors 15 are radially arranged, and wafers W are supported on both sides of each of the susceptors, so that number of wafers W capable of being treated at once is increased. The wafers W are subjected to uniform induction heating with the coil 17. COPYRIGHT: (C)1982,JPO&Japio

Inventors

• 👤 Noriyoshi Nakazawa
• 👤 Akira Kanai
• 👤 Hiroo Tochikubo

Bibliographic Details