High-purity silica-forming coating solution

Abstract

Abstract PURPOSE: To provide the titled coating soln. having excellent corrosionproofness and suitable as a raw material for the production of an insulating film for electronic parts, by treating a reaction product between a halogenosilane or an alkoxysilane and a carboxylic acid or water with ion exchange resins. CONSTITUTION: One mol of a halogenosilane of formulaI(wherein X is halogen; R is alkyl or aryl; n is 0W3) such as trimethyltrichlorosilane or an alkoxysilane of formula II (wherein X is halogen; R' is alkyl, aryl or glycidoxyalkyl; n is 0W4) such as dimethoxydichlorosilane, is reacted with 2W8mol of a carboxylic acid such as acetic acid or water in the presence of a catalyst such as hydrochloric acid and in an org. solvent. The reaction product is treated with a basic anion exchange resin, and then with a strongly acidic cation exchange resin to produce the desired coating soln. COPYRIGHT: (C)1982,JPO&Japio

Inventors

• 👤 Toshihiro Nishimura
• 👤 Mitsuaki Minato
• 👤 Akira Hashimoto
• 👤 Muneo Nakayama

Bibliographic Details