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JPS5772367A Expired / Lapsed JP ⏱️ 0.0 years remaining

Fusing type semiconductor device

Assignee: Toshiba Corp
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Filing: 1980-10-24
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Granted: —
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Expires: 2000-10-24
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Abstract

Abstract PURPOSE:To prevent the remarkable drop of fuse resistance by partially changing silicon composing fuse into a metallic silicide in a fusing type PROM cell. CONSTITUTION:The pad sections 31 of the fuse are turned into the metallic silicide, contacting property with wiring metal is improved and resistance value at the pad sections 31 is lowered. The resistance value of the fuse does not drop remarkably because the resistance of a fuse section 32 is mainly effective. Accordingly, the small fuse having high reliability can be obtained by changing one part of the fuse into the metallic silicide.

Inventors

  • 👤 Satoshi Shinozaki

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-05 14:24
CPC Classifications
G; G11; G11C; G11C17/00; G11C17/14; G11C17/16

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