Measuring method for heat transmission factor of thin film

Abstract

Abstract PURPOSE:To reliably measure a heat transmission factor of a thin film element on a substrate, by a method wherein a known material, being low in a melting point and absorbing a laser light, is formed in a filmy manner on a surface of an object to be measured, and the work is irradiated with a pulse laser light. CONSTITUTION:In an optimum design of an integrated circuit element and other film electronic element and a design of a radiating heat transmission object, a film 3 of a known material, e.g., Sn, Pb, being low in a melting point and absorbing a pulse laser light, is formed in about 500Angstrom thickness on a thin film 2 to be measured on a substrate 1 by a vacuum evaporation method. The heat transmission factor of the thin film 2 is found by computing it by a given heat diffusion equation from an energy value obtained until the film 3 is molten for the deformation through the irradiation with a pulse laser light 4 from the location above the film 3. This causes to perform a reliable measurement of the heat transmission factor of the thin film 2, being in the thickness of 1mu or less, with a minimum of the influence affected by the substrate.

Inventors

• 👤 Susumu Fujimori
• 👤 Koji Takei
• 👤 Sakae Maebotoke
• 👤 Kazutoshi Nagai

Bibliographic Details