Plasma reactor

Abstract

Abstract PURPOSE:To perform a uniform plasma etching by convering both the surfaces of a conductor with an insulator in a reaction tube, disposing a cylinder having many fine holes coaxially, and connected the conductor to an eaeth in a plasma reactor. CONSTITUTION:A cylinder 19 having an outer diameter smaller than the inner diameter thereof, insulators 16, 17 convered on both side surfaces of a conductor 15 and many fine holes 18 on the wall surface is arranged coaxially via an insulating spacer 20 in a reaction tube 1. The conductor 15 is connected to an earth. A plasma gas guide tube 8 is mounted on the tubular wall of the tube 1, gas plasma is supplied thereto, and material to be etched is etched. In this manner, the interior of the cylinder is completely plasma treated, impurity contamination is eliminated, and uniform etching can be performed at a low temperature.

Inventors

• 👤 Takao Kawaguchi

Bibliographic Details