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JPS5760641A Expired / Lapsed JP ⏱️ 0.0 years remaining

Manufacture of shadow mask

Assignee: Toshiba Corp
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Filing: 1980-09-30
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Granted: —
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Expires: 2000-09-30
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Abstract

Abstract PURPOSE:TO reduce the amount of side etching and form efficiently opening holes of an assigned shape by proceeding to the etching process after forming a temporary etching-proof film on the surface of a metallic plate provided with small drilled holes. CONSTITUTION:After forming photosensitive films 23, 24 on both main surfaces 21, 22 of a metalic plate 20 respectively, a negative plate 25 having negative patterns 25A of drilled holes of a smaller diameter and a negative plate 26 having negative patterns 26A of drilled holes of a larger diameter are set on its one side 21 and the other side 22 respectively, and those negative patterns are printed on the sensitive films 23, 24 respetively by projecting the light beam 33 of ultraviolet or the like. Next, a sensitive film dissolving agent as an alkaline solution or the like and an outer surface activator are sprayed on the surface with drilled holes of a smaller diameter and the surface with drilled holes of a larger diameter respectively, and then, this temporary etching proof films 27 are formed on the surfaces 23 to be provided with those holes of a smaller diameter by spraying a hardener only on said surface, and for the surfaces 242 related to a larger diameter, the surface of the metallic plate 20 is kept exposed. Thereby, the amount of side etching on the surface provided with drilled holes of a smaller diameter is reduced, and a high-grade mask of an exact hole diameter can be obtained.

Inventors

  • 👤 Yasuhisa Otake
  • 👤 Shingo Watabe

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-08 16:17
CPC Classifications
H; H01; H01J; H01J9/00; H01J9/02; H01J9/14; H01J9/142

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