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JPS5747744A Expired / Lapsed JP ⏱️ 0.0 years remaining

Etching method for glass

Assignee: Toyo Glass Co Ltd
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Filing: 1980-08-30
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Granted: —
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Expires: 2000-08-30
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Abstract

Abstract PURPOSE: To form a satin pattern having many protrusions and recesses of ≥ about 0.2mm on the surface of glass by immersing the glass in an etching soln. consisting of a specified amount of hydrofluoric acid, ammonium fluoride, hydrochloric acid, sulfuric acid, nitric acid and water and by applying movement, vibration or rotation to the glass or a flow, agitation or rotation to the soln. CONSTITUTION: An etching soln. is composed of 5W40% hydrofluoric acid, 16W 33% ammonium fluoride, 0W20% hydrochloric acid, 0W25% sulfuric acid, 0W35% nitric acid and 30W65% water. Glass is immersed in the etching soln., and movement, vibration or rotation is applied to the glass, or a flow, agitation or rotation to the soln. After a fixed time, the glass is pulled up and washed. The surface of the glass 10 thus treated is converted into a satin surface having many protrusions 11. The inclined planes 12 of the protrusions 11 are different from each other in gradient, and reflected rays 14 of light are not uniform to irradiated rays 13 and cause irregular reflection, so that glass surface shines brilliantly. COPYRIGHT: (C)1982,JPO&Japio

Inventors

  • 👤 Yoshiaki Haneya

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-03 17:51
CPC Classifications
C; C03; C03C; C03C15/00; C03C15/02

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