Feeding apparatus for starting material for glass

Abstract

Abstract PURPOSE:To saturate a carrier gas with vapor of starting material for glass and to carry the vapor by the desired amount by arranging a plurality of containers filled with liq. starting material for glass to be bubbled with the carrier gas in series and maintaining the temp. of every preceding container at higher temp. then the temp. of every succeeding container. CONSTITUTION:SiCl4 is used as starting material for glass and Ar is used as a carrier gas, respectively. By opening valves 27-30 and valves 23, 24 and closing a valve 25, Ar is allowed to flow into a branch passing through the starting material for glass. After regulating the flow rate to a uniform value. Ar is allowed to flow into the 1st-stage container 31 feeding the starting material for glass and into the 2nd-stage similar container 32 in succession. The containers 31, 32 are filled with SiCl4, and the temp. of the former and that of the latter are adjusted to about 53.5 deg.C and about 50 deg.C, respectively. When vaporized starting material for glass is carried, the internal temp. of a chamber 39 is kept at a constant temp. (55 deg.C) or above with a fan 35, a heater 36, a power source 37 and a temp. sensor 38 to prevent the recoagulation of the material.

Inventors

• 👤 Hiroyuki Suda
• 👤 Kazunori Senda
• 👤 Shoichi Sudo
• 👤 Motohiro Nakahara
• 👤 Nobuo Inagaki

Bibliographic Details