Forming method for minute pattern

Abstract

Abstract PURPOSE:To shorten a drawing time by irradiating a fixed quantity of particle beams or radiation having the cutting action of a principal chain or a crosslinking of a resist substance onto a main surface of a resist containing a drawing section. CONSTITUTION:A fixed quantity of electron beam showers 4 are irradiated previously onto the whole surface of the electron beam resist 2 on a substrate 1 before drawing. When electron beams 3 for drawing are irradiated, the time may be short. When the surface is developed, the resist pattern 2 is obtained. According to this constitution, the drawing time is short, and working property is excellent.

Inventors

• 👤 Yoji Masuko
• 👤 Takayuki Matsukawa

Bibliographic Details