Cleaning of wafer

Abstract

Abstract PURPOSE:To improve the quality and yield of a wafer by a wafer cleaning apparatus which has a loader for supplying the wafer, a clean tunnel unit for conveying it in a clean atmosphere, a unit for washing and rotatably drying the wafer, and a microwave heater for completely drying it. CONSTITUTION:A cartridge 7 containing wafers 6 is charged into a clean loader chamber 11, wafers are supplied one by one, and are conveyed in a direction C1. The wafer is then introduced through a clean tunnel 21 in the clean atmosphere and is set on a wafer chuck 24 of a washing and rotatably drying unit. After water 25 is supplied from a cleaning nozzle 30 and the wafer is washed, the chuck 24 is rotated at a high speed, and the wafer is thus dried from water. After completion, the wafer is set via a conveyor belt 22 on the chuck of the next drying chamber, and is completely dried by microwave induction heating with a magnetron. In this manner, the wafer can be cleaned and dried completely, thereby improving the quality and the yield of the characteristics of a semiconductor device.

Inventors

• 👤 Haruo Amada

Bibliographic Details