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JPS5722239A Expired / Lapsed JP ⏱️ 0.0 years remaining

Dry type diazo developing method

Assignee: Ricoh Co Ltd
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Filing: 1980-07-15
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Granted: —
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Expires: 2000-07-15
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Abstract

Abstract PURPOSE:To make the reduction in size and cost of a device possible by introducing a minimum amount of ammonia necessary for developing to a developing part having exhaust chambers only during copying then sucking the same of the amount specific times that of the introduced gas through the exhaust chambers. CONSTITUTION:The spacing between guide plates has a clearance of 5mm. at the largest, and more preferably about 3mm., and exhaust chambers 3 are provided to a supply port for exposed photosensitive paper 6 and ejecting port for developed photosensitive paper, respectively; in addition, boxes 4 for feed rollers are provided, thereby constituting a developing part 1. Only during copying, ammonia is introduced from an ammonia cylinder 9 through a distributing piping 2 into this developing part 1 at a minimum amount required for developing by operating a solenoid valve 8, and the gas of the amount 50-500 times are amount of the introduced gas is sucked from the chambers 2. This is introduced into a deodorizing chamber 10 of active carbon beds of the like. Thereby, the need for any exhaust duct is eliminated, and deodorization and the supply controlling of ammonia are easily accomplished.

Inventors

  • 👤 Takeshi Matsui
  • 👤 Hideo Watanabe
  • 👤 Norihisa Takahashi

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-03 10:54
CPC Classifications
G; G03; G03D; G03D7/00

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