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JPS5657035A Expired / Lapsed JP ⏱️ 0.0 years remaining

Positive type photosensitive composition

Assignee: Fuji Yakuhin Kogyo KK
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Filing: 1979-10-15
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Granted: —
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Expires: 1999-10-15
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Abstract

Abstract PURPOSE:To obtain a positive type photosensitive composition for a lithographic plate with high sensitivity and giving a visible image easy to discriminate by mixing a specified sulfophthalein pH indicator and a basic substance soluble in org. solvent into an o-quinone diazide photosensitizer. CONSTITUTION:A photosensitive soln. is prepared by mixing a sulfophthalein pH indicator represented by the formula (where each of A1-A4 is denoted by H or halogen and each of R1-R4 and R1'-R4' is H, halogen or lower alkyl) and a basic substance soluble in org. solvent into an o-quinone diazide photosensitizer such as o-naphthoquinone diazidosulfonate. The soln. is applied to an Al plate for a lithographic plate, dried, and contact exposed through a positive film. The color of exposed part turns into light-yellow and is clearly discriminated from the unexposed part in color with yellow safe light. Accordingly, locating can be made easily in superposition printing of many-sided printing in a printing or plate making process.

Inventors

  • 👤 Takateru Asano

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-02 11:45
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/105

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